CVD/PECVD Deposition System

Product Overview

The CVD/PECVD system is a thin film deposition device based on PECVD technology. It enables thin film formation of metals, semiconductors, and insulators for microelectronics, photonics, FPD, and energy storage applications.

Features

Max temperature: 1200°C (HRE resistance wire)

Intelligent control: 50-step programmable automatic control system.

Double-layer air-cooling system keeps exterior surface temperature below 50°C.

High-quality insulation: Vacuum-formed alumina polycrystalline fiber using Japanese technology.

High-vacuum seal: SUS304 stainless steel KF quick-release flanges.

High deposition: RF glow discharge achieves up to 10 Å/s.

Excellent uniformity: Multi-point RF feed-in, specialized gas flow, and heating achieve film uniformity within 8%.

High reproducibility: Substrate-to-substrate variation below 2% per batch.

Safety: Over-temperature protection (auto power-off), leakage protection.

Standard: Direct-coupled vacuum pump (10 Pa), 3-channel MFC.

RF power: 500W max, 13.56 MHz ±0.005%, single-phase AC 208-240V.

Options

● High vacuum system (turbo molecular pump: 7×10⁻⁴ Pa)

● Gas mixing system and additional MFC

● High-resolution touch panel

Technical Specifications

Product NameCVD Chemical Vapor Deposition System
Model NameCVD/PECVD
Slide MechanismWith slide rail. Rapid heating/cooling by moving the furnace body.
Heating Length400mm (1 zone / 2 zone available)
Tube DimensionsOD 60mm × Length 1200mm
Tube MaterialHigh-purity quartz tube
Working Temp.≤ 1100℃
Control MethodAutomatic temperature control by AI-equipped PID instrumentation
Control Accuracy±1°C (with over-temp / disconnection alarm)
Heating RateRecommended 0-10°C/min
Heating ElementHigh-quality resistance wire

Vacuum System

ItemSpecification
Rated VoltageSingle-phase 220V 50Hz
Compatible GasInert gases (N2, Ar, etc.) and various process gases
Vacuum FlangeGas inlet port, pressure regulator valve, auto leak valve, exhaust valve
Gas Supply System4-channel high-precision MFC, touch panel control
Vacuum ExhaustRotary pump (ultimate vacuum 1Pa at cold state), high-precision digital vacuum gauge
Pressure ControlControllable in relative pressure range -20kPa to 20kPa

RF Power Supply (PECVD Models Only)

ItemSpecification
Rated VoltageSingle-phase 220V 50Hz
Signal Frequency13.56 MHz ± 0.005%
Max Output500W
Max Reflected Power500W
Output Connector50Ω N-type (female)
Output Stability±0.1%
Harmonic Component≤ -50 dBc
Supply VoltageSingle-phase AC 187V-253V (50/60Hz)
Cooling MethodForced air cooling

CVD Series

ModelTube Dia. × Heating Length (mm)Total Tube Length (mm)Power (kW)Max Temp. (°C)Gas ControlVacuum (Pa)
CVD-60Φ60×4001200312003-channel10Pa/7x10-3
CVD-80Φ80×4001200412003-channel10Pa/7x10-3
CVD-100Φ80×4001200612003-channel10Pa/7x10-3

PECVD Series

Model Tube Dia. × Heating Length (mm) Power (kW) Max Temp. (°C) RF Power Gas Control Vacuum (Pa)
Frequency Output
PECVD-60Φ60×4504120013.56MHz±0.005%300-500W3-channel10Pa/7x10-3
PECVD-80Φ80×450512003-channel10Pa/7x10-3
PECVD-100Φ100×450712003-channel10Pa/7x10-3

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